E-beam lithography and optical near-field lithography: new prospects in fabrication of various grating structures
E-beam lithography and optical near-field lithography: new prospects in fabrication of various grating structures
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电子束光刻和光学近场光刻：各种光栅结构制造的新前景
DOI：
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发表时间：
2003
期刊：
影响因子：
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通讯作者：
T. Clausnitzer
中科院分区：
文献类型：
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作者：
E. Kley;T. Clausnitzer
当今可用于制造微结构光学元件的技术已经针对特定类型的结构得到了很好的发展。用于非常复杂的光学功能或光学功能与其他功能的组合的技术或多或少处于研究或实验室水平。复杂光栅制造的一种有前途的方法是使用光学近场全息术（NFH）和电子束写入来统一优点。该论文希望展示这两种技术本身的潜力以及它们的团队合作所产生的潜力。该论文展示了 NFH 使用电子束写入掩模制造的一维和二维光栅、啁啾和单向光栅。它还展示了在二元、多级和连续光学轮廓上制造光栅的可能性。
Today’s technologies available for the fabrication of micro structured optical elements are well developed for defined classes of structures. Techniques for very complex optical functions or for combinations of optical functions together with others are more or less in the level of research or labs. A promising approach for complex grating fabrication is the use of optical near field holography (NFH) and e-beam writing for unification of the advantages. The paper wants to show the potential of both techniques itself as well as the potential that arises from their teamwork. The paper demonstrates one and two dimensional gratings, chirped and unidirectional gratings fabricated by NFH using e-beam written masks. It shows also possibilities for the fabrication of gratings on binary, multilevel and continuous optical profiles.