HIGH-RESOLUTION ELECTRON-BEAM INDUCED DEPOSITION
HIGH-RESOLUTION ELECTRON-BEAM INDUCED DEPOSITION
复制标题
DOI:
10.1116/1.584045
复制
发表时间:
1988-01-01
影响因子:
1.4
通讯作者:
BAUM, TH
中科院分区:
文献类型:
--
作者:
KOOPS, HWP;WEIEL, R;BAUM, TH