CHIRAL SURFACE FORMATION OF COPPER FILMS BY MAGNETOELECTROCHEMICAL ETCHING
CHIRAL SURFACE FORMATION OF COPPER FILMS BY MAGNETOELECTROCHEMICAL ETCHING
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DOI：
10.22364/mhd.51.2.21
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发表时间：
2015-04-01
影响因子：
0.7
通讯作者：
Watanabe, K.
中科院分区：
文献类型：
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作者：
Mogi, I.;Aogaki, R.;Watanabe, K.
研究了在磁电化学腐蚀中手性表面的形成。铜膜的蚀刻在恒电流条件下进行，在垂直于电极表面的5T的磁场中具有不同的蚀刻电流。丙氨酸对映体之间的伏安图中的手性膜电极表现出电流差，并且这种手性行为取决于蚀刻电流和磁场极性在双金属化过程。
Formation of a chiral surface was investigated in magnetoelectrochemical etching (MEE). The MEE of copper films was conducted in galvanostatic conditions with various etching currents in a magnetic field of 5 T perpendicular to the electrode surfaces. The MEE film electrodes exhibited a current difference in voltammograms between alanine enantiomers, and such chiral behavior depended on the etching current and magnetic field polarity at the MEE processes.