Dissociative electron attachment and dissociative ionization of CF3AuCNC(CH3)3, a potential FEBID precursor for gold deposition
Dissociative electron attachment and dissociative ionization of CF3AuCNC(CH3)3, a potential FEBID precursor for gold deposition
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DOI：
10.1140/epjd/s10053-023-00721-6
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发表时间：
2023-08-01
影响因子：
1.8
通讯作者：
Ingolfsson，O.
中科院分区：
文献类型：
--
作者：
Kamali，Ali;Carden，Will G.;Ingolfsson，O.
值得注意的是，目前致力于设计合适的有机金属前体，用于用聚焦电子束诱导沉积（FEBID）制造金属纳米结构，FEBID是一种具有3D图案化的高潜力的直写方法。在这种情况下，潜在的前体与低能电子的初始相互作用是至关重要的，电子诱导的配体损失的程度决定了所得沉积物的组成。特别感兴趣的是含金前体，因为金的光电性质为3D纳米结构的各种等离子体和光增强应用提供了潜力。在这里，我们研究了低能电子诱导的CF3AuCNC（CH3）3通过解离电离（DI）和解离电子附着（DEA）在气相中的单碰撞条件下，在碰撞稳定的条件下，提供的碎裂。我们进一步比较了在这些条件下观察到的碎片模式与FEBID条件下从该前体形成的沉积物的组成。在DI中，发现在单一碰撞条件下与提供碰撞稳定的条件相比，相对强度存在显著差异，而在这两种条件下，仅打开相同的DEA通道。与在FEBID条件下形成的沉积物的组合物的比较表明，初始电子诱导的碎裂过程并不直接反映在存款的组合物中。相反，我们期望这些决定固定化片段的初始组成，而存款的最终组成是由固定化后进一步辐射引起的电子诱导的二级和三级反应决定的。图形摘要
Appreciable effort is currently committed to designing suitable organometallic precursors for fabrication of metallic nanostructures with focused electron beam induced deposition (FEBID)—a direct write method with high potential for 3D patterning. In this context, the initial interaction of the potential precursor with low energy electrons is critical and the extent of electron-induced ligand loss determines the composition of the resulting deposits. Specifically of interest are gold-containing precursors, as the optoelectronic properties of gold provide potential for a variety of plasmonic and light enhancing applications of 3D nanostructures. Here, we study low energy electron-induced fragmentation of CF3AuCNC(CH3)3through dissociative ionization (DI) and dissociative electron attachment (DEA) in the gas phase under single collision conditions and under conditions where collisional stabilization is provided. We further compare the fragmentation patterns observed under these conditions with the composition of deposits formed from this precursor under FEBID conditions. In DI, a significant difference in relative intensities is found under single collision conditions as compared to conditions where collisional stabilization is provided, while under both these conditions, only the same DEA channel is open. Comparison with the composition of deposits formed under FEBID conditions shows that the initial electron-induced fragmentation processes are not directly reflected in the deposit’s composition. Rather, we expect these to determine the initial composition of immobilized fragments, while the final composition of the deposit is determined by electron-induced secondary and tertiary reactions caused by further irradiation after immobilization.Graphical abstract