Polarization-selective subwavelength grating used with 193 nm light
Polarization-selective subwavelength grating used with 193 nm light
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DOI：
10.1016/j.optcom.2010.04.073
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发表时间：
2010-11-15
影响因子：
2.4
通讯作者：
Fan, Jin Guo
中科院分区：
文献类型：
--
作者：
Guo, Kang Guo;Feng, Tan Qiao;Fan, Jin Guo
Hyper-NA ArF (193 nm) immersion lithography is one of the most potential technologies to achieve 32 nm critical dimension node. At the corresponding large angles in the photoresist, control of polarization becomes necessary. A polarization beam splitter (PBS) based on a subwavelength dielectric grating has been designed for use with 193 nm light. The polarization-selective property of such grating is explained by the mechanism of mode interference. The designed grating working as a 1 x 2 beam splitter can transmit TM wave (similar to 90%) to the zeroth order with extinction ratio of 753, and it diffracts TE wave (similar to 80%) to the -1st order with extinction ratio of 300. (C) 2010 Elsevier B.V. All rights reserved.
