Optimizing the optical and electrical properties of graphene ink thin films by laser-annealing
Optimizing the optical and electrical properties of graphene ink thin films by laser-annealing
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DOI：
10.1088/2053-1583/2/1/011003
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发表时间：
2015-03-01
期刊：
影响因子：
5.5
通讯作者：
Lemme, Max C.
中科院分区：
文献类型：
--
作者：
Del, Sepideh Khandan;Bornemann, Rainer;Lemme, Max C.
我们展示了一种简单的石墨烯基透明导电膜的制造技术。通过将高效的激光退火技术与高浓度石墨烯油墨的一次性滴铸结合，获得高度平坦和均匀的石墨烯膜。所得的薄膜是均匀的，并且在550 nm处表现出大于85%的透明度和约30 k Ω/平方的薄层电阻。这些值构成的透明度增加45%，表面粗糙度的四个因素的减少和薄层电阻的70%的减少相比，未退火的膜。
We demonstrate a facile fabrication technique for graphene-based transparent conductive films. Highly flat and uniform graphene films are obtained through the incorporation of an efficient laser annealing technique with one-time drop casting of high-concentration graphene ink. The resulting thin films are uniform and exhibit a transparency of more than 85% at 550 nm and a sheet resistance of about 30 k Omega/square. These values constitute an increase of 45% in transparency, a reduction of surface roughness by a factor of four and a decrease of 70% in sheet resistance compared to un-annealed films.