Properties of Inductively‐Coupled Plasmas Driven by Multiple Low‐Inductance Internal‐Antenna Units
Properties of Inductively‐Coupled Plasmas Driven by Multiple Low‐Inductance Internal‐Antenna Units
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多个低电感内部天线单元驱动的电感耦合等离子体的特性
DOI：
10.1002/ppap.200732318
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发表时间：
2007
影响因子：
3.5
通讯作者：
A. Ebe
中科院分区：
文献类型：
--
作者：
K. Takenaka;Y. Setsuhara;Kazuaki Nishisaka;A. Ebe
我们研制了由多个低电感天线(LIA)单元支撑的圆柱形射频等离子体源，并测量了Ar等离子体的等离子体参数。在射频功率为2 000W时，等离子体密度最高可达1012 cm−3。在高密度等离子体中，等离子体电势可低至13~14V，在10V时，等离子体电势降几乎不变。在射频功率为200~2 000W，当Ar气压为1.3Pa时，测量了Ar离子的动能分布，其峰值与等离子体电势大小基本一致。
We have developed cylindrical RF plasma sources sustained with multiple low-inductance antenna (LIA) units and have measured plasma parameters for argon plasmas. The plasma source could be operated at 2 000 W RF powers to attain plasma densities as high as 1012 cm−3. The plasma potential as low as 13–14 V in high-density plasmas has been achieved and the potential drop from plasma potential to floating potential was almost constant at 10 V. Kinetic energy distributions of Ar ions were measured at argon pressures around 1.3 Pa in an RF power range of 200–2 000 W, which have peaks which almost correspond to the magnitude of the plasma potential.