Self-regulated growth of CaVO3 by hybrid molecular beam epitaxy
Self-regulated growth of CaVO3 by hybrid molecular beam epitaxy
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混合分子束外延自调控 CaVO3 生长
DOI：
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发表时间：
2017
期刊：
影响因子：
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通讯作者：
R. Engel
中科院分区：
文献类型：
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作者：
C. Eaton;J. Lapano;Lei Zhang;M. Brahlek;R. Engel
报道了用混合分子束外延技术在LaSrAlO4(001)衬底上生长化学计量比CaVO_3薄膜的方法。在不同的VTIP流量下，使用固定的Ca流量生长薄膜。采用反射高能电子衍射仪、X射线衍射仪、原子力显微镜、能量色散X射线能谱和高分辨电子显微镜对薄膜质量与生长条件之间的关系进行了研究。发现了一个宽的生长窗口，在这个窗口中，薄膜是化学计量的，并且薄膜的晶格参数与Ca/VTIP流量比无关，允许在保持化学计量生长条件的情况下，Ca流量的非故意偏差超过10%。在生长窗口内生长的薄膜表面原子光滑，具有阶梯状形貌和窄的摇摆曲线，X-射线衍射谱显示出全宽的振动曲线。
The authors report on the growth of stoichiometric CaVO3 thin films on LaSrAlO4 (001) using hybrid molecular beam epitaxy approach, whereby the metalorganic vanadium oxytriisopropoxide (VTIP) and Ca was cosupplied from a gas injector and a conventional effusion cell, respectively. Films were grown using a fixed Ca flux while varying the VTIP flux. Reflection high energy electron diffraction, x-ray diffraction, atomic force microscopy, energy-dispersive x-ray spectroscopy, and high resolution transmission electron microscopy were employed to relate film quality to growth conditions. A wide growth window was discovered in which the films were stoichiometric and film lattice parameter was found independent of the Ca/VTIP flux ratio, allowing more than 10% unintentional deviation in the Ca flux while maintaining stoichiometric growth conditions. Films grown within the growth window showed atomically smooth surfaces with stepped terrace morphology and narrow rocking curves in x-ray diffraction with a full widt...