Doping silica beyond limits with laser plasma for active photonic materials
Doping silica beyond limits with laser plasma for active photonic materials
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DOI：
10.1364/ome.5.002849
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发表时间：
2015-12-01
影响因子：
2.8
通讯作者：
Jose, Gin
中科院分区：
文献类型：
--
作者：
Chandrappan, Jayakrishnan;Murray, Matthew;Jose, Gin
稀土在二氧化硅中的有限溶解度阻碍了损耗补偿光子集成电路的发展。我们报告了一种使用飞秒激光等离子体辅助的稀土掺杂亚碲矿与二氧化硅混合材料集成的新方法，实现了Er3+和Yb3+-离子的高掺杂浓度，1.63 x 10(21)atoms.cm(-3)，无偏析，经Er3+:I-4(13/2)寿命验证为9.1 ms。两个单独的稀土 (Er3+/Yb3+) 掺杂亚碲酸盐玻璃靶材的连续烧蚀产生了 Er3+ 和 Yb3+ 离子的特殊混合，延伸到具有尖锐界面的原始二氧化硅。在二氧化硅基质中用Er3+-Yb3+-离子形成这种均匀的玻璃结构不可能通过常规方法实现。 (C)2015 美国光学学会
The limited solubility of rare-earths in silica hampers the development of loss-compensated photonic integrated circuits. We report a novel method using femtosecond laser plasma assisted hybrid material integration of rare-earth-doped tellurite with silica, achieving high doping concentration of Er3+ and Yb3+-ions, 1.63 x 10(21) atoms.cm(-3), without segregation validated by Er3+:I-4(13/2) lifetime of 9.1 ms. The sequential ablation of two individual rare-earth (Er3+/Yb3+) doped-tellurite glass targets produces an exceptional intermixing of Er3+ and Yb3+-ions extending to the pristine silica with sharp interface. Formation of such homogeneous glass structure with Er3+-Yb3+-ions in a matrix of silica is not possible to realise by conventional methods. (C)2015 Optical Society of America