Interference Phenomena at Transparent Layers in Glow Discharge Optical Emission Spectrometry
Interference Phenomena at Transparent Layers in Glow Discharge Optical Emission Spectrometry
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辉光放电发射光谱法中透明层的干涉现象
DOI：
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发表时间：
1999
期刊：
影响因子：
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通讯作者：
U. Beck
中科院分区：
文献类型：
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作者：
V. Hoffmann;R. Kurt;K. Kämmer;R. Thielsch;T. Wirth;U. Beck
在辉光放电发射光谱（GD-OES）深度剖析中，测量了样品和溅射气体元素的发射谱线强度随溅射时间的变化。射频（rf）溅射将应用领域扩展到包括透明层在内的非导电样品。对于厚度范围高达几微米的透明涂层，观察到测量强度的振荡。这种行为是由薄膜干涉效应解释，并讨论了三种不同的材料，即，SiO2、TiO 2和BaTiO 3。因此，一个新的程序，无论是确定层厚度或折射率从GD-OES深度分布。这种影响也必须考虑定量GD-OES分析。
At the performance of depth profiling by glow discharge optical emission spectroscopy (GD-OES) the intensities of optical emission lines of sample and sputter gas elements are measured in dependence on the time of sputtering. Radio-frequency (rf) sputtering extended the field of application to nonconducting samples including transparent layers. For transparent coatings in the thickness range up to some micrometers, oscillations of measured intensities were observed. This behavior is explained by a thin-film interference effect and discussed for three different materials, i.e., SiO2, TiO2, and BaTiO3. As a result, a new procedure for the determination of either layer thickness or refractive index from GD-OES depth profiles is presented. This effect has to be considered for quantitative GD-OES analysis as well.