Measurement of aberrations in microlenses using a Shack-Hartmann wavefront sensor
Measurement of aberrations in microlenses using a Shack-Hartmann wavefront sensor
复制标题
使用 Shack-Hartmann 波前传感器测量微透镜的像差
DOI：
10.1117/12.451325
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发表时间：
2002
期刊：
影响因子：
--
通讯作者：
Keith Ratte
中科院分区：
文献类型：
--
作者：
P. Pulaski;J. Roller;D. Neal;Keith Ratte
我们已经使用Shack-Hartmann波前传感器系统测量了熔融石英和硅微透镜的波前像差。Shack-Hartmann传感器使用微透镜阵列和CCD相机的组合来测量相对于参考波前的波前局部倾斜。然后，数据简化软件重建波前，并以各种形式表示，如Seidel或Zernike。我们测量了一系列我们的定制微透镜阵列，通过将光纤光源放置在阵列后面一个焦距的距离处，以从单个小透镜创建一系列准直光束。然后，我们通过使用不同的孔径转换器（对于不同尺寸的小透镜）来扩展各个光束，使得它们填充CCD区域的显著部分，来观察来自单个小透镜的准直光束的质量。对于这些微透镜阵列，发现P-V OPD小于λ/4，RMS波前误差小于λ/20。
We have measured the wavefront aberrations of fused silica and silicon microlenses using a Shack-Hartmann wavefront sensor system. The Shack-Hartmann sensor uses a combination of a microlens array and a CCD camera to measure wavefront local tilts with respect to a reference wavefront. Data reduction software then reconstructs the wavefront and expresses it in various forms such as Seidel or Zernike. We measured a series of our custom microlens arrays by placing a fiber source at a distance of one focal length behind the array to create a series of collimated beams from the individual lenslets. We then observed the quality of the collimated beams from single lenslets by using different aperture converters (for different sized lenslets) to expand the individual beams so that they filled a significant portion of the CCD area. For these microlens arrays, the P-V OPD was found to be less than λ/4 and the RMS wavefront error less than λ/20.