Polymer-Pen Chemical Lift-Off Lithography

Polymer-Pen Chemical Lift-Off Lithography
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DOI:
10.1021/acs.nanolett.7b01236
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发表时间:
2017-05-01
期刊:
影响因子:
10.8
通讯作者:
Weiss, Paul S.
Weiss, Paul S.
中科院分区:
材料科学1区
文献类型:
--
作者:
Xu, Xiaobin;Yang, Qing;Weiss, Paul S.

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我们设计并制造了具有亚 20 nm 尖端的大型聚合物笔阵列,用于执行化学剥离光刻 (CLL)。因此,我们开发了一种称为聚合物笔化学剥离光刻 (PPCLL) 的混合图案化策略。我们使用金字塔形和 V 形聚合物笔阵列演示了 PPCLL 图案。相关模拟揭示了聚合物笔的接触线宽度与其他两个变量之间的纳米级二次关系:聚合物笔基线宽度和垂直压缩距离。我们设计了一种印章支撑系统,由散布的平头聚合物笔阵列组成,这些笔比所有其他尖头聚合物笔都要高。这些支撑部分或完全抵消印章重量,从而也可用作调平系统。我们研究了一系列具有已知高度差的 V 形聚合物笔,以模仿高精度扫描平台,在 20 nm 级以下精确控制每个聚合物笔的相对垂直位置。在此过程中,我们获得了线宽低于 50 nm 至低于 500 nm 且线宽最小可调增量低于 20 nm 的链烷硫醇线性阵列图案。 CLL 图案线宽与模拟预测的一致。我们的结果表明,通过印章支撑系统的明智设计和聚合物笔底座宽度的调整,可以通过消除 PPCLL 中对扫描台系统的需求来提高吞吐量,而无需牺牲精度。为了证明 PPCLL 图案化的功能微阵列,我们将探针 DNA 插入 PPCLL 图案中并观察互补靶序列的杂交。
We designed and fabricated large arrays of polymer pens having sub-20 nm tips to perform chemical lift-off lithography (CLL). As such, we developed a hybrid patterning strategy called polymer-pen chemical lift-off lithography (PPCLL). We demonstrated PPCLL patterning using pyramidal and v-shaped polymer-pen arrays. Associated simulations revealed a nanometer-scale quadratic relationship between contact line widths of the polymer pens and two other variables: polymer-pen base line widths and vertical compression distances. We devised a stamp support system consisting of interspersed arrays of flat-tipped polymer pens that are taller than all other sharp-tipped polymer pens. These supports partially or fully offset stamp weights thereby also serving as a leveling system. We investigated a series of v-shaped polymer pens with known height differences to control relative vertical positions of each polymer pen precisely at the sub 20 nm scale mimicking a high-precision scanning stage. In doing so, we obtained linear-array patterns of alkanethiols with sub-SO nm to sub-500 nm line widths and minimum sub-20 nm line width tunable increments. The CLL pattern line widths were in agreement with those predicted by simulations. Our results suggest that through informed design of a stamp support system and tuning of polymer-pen base widths, throughput can be increased by eliminating the need for a scanning stage system in PPCLL without sacrificing precision. To demonstrate functional microarrays patterned by PPCLL, we inserted probe DNA into PPCLL patterns and observed hybridization-by complementary target sequences.