Atomic Hydrogen in Thick H2 Films at Temperatures 0.05–2 K
Atomic Hydrogen in Thick H2 Films at Temperatures 0.05–2 K
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温度 0.05–2 K 下 H2 厚膜中的原子氢
DOI：
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发表时间：
2011
期刊：
影响因子：
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通讯作者：
S. Vasiliev
中科院分区：
文献类型：
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作者：
J. Järvinen;V. Khmelenko;D. M. Lee;J. Ahokas;S. Vasiliev
我们描述了在0.05K到2.0K温度范围内稳定在100K厚的氢膜中的氢原子的实验。分子氢矩阵是直接从天然气中凝聚而成的。氢原子是在低于1K的等离子体放电中产生的，并用电子自旋共振进行了研究。在固体H2中，H密度达到2×10~(19)cm−_3。正如前面在薄膜H2中观察到的，我们发现原子布居具有很高的稳定性，并且在最低温度下对最低的两个超精细态的玻尔兹曼统计有很大的偏离。在厚膜中，我们发现ESR共振线由两个间隔很近的不同宽度的分量组成，表示氢气基质中高和低浓度H原子的不同区域。升温后，两个组分表现出非常不同的复合速率，高密度组分在T&gT；1℃时复合速率较快。我们讨论了原子相互作用和迁移率，以及H原子在H_2基质中的样品结构。
We describe experiments on hydrogen atoms stabilized in a 100 μm thick H2 film at temperatures between 0.05 and 2 K. The molecular hydrogen matrix was condensed directly from natural hydrogen gas. The H atoms are produced with a plasma discharge at temperatures below 1 K and studied with electron spin resonance. H densities of 2×1019 cm−3 in solid H2 were reached. As observed earlier in thin H2 films, we found a high stability of atomic populations and strong deviation from Boltzmann statistics of lowest two hyperfine states at the lowest temperatures. In thick films we found that the ESR resonance lines consisted of two closely spaced components with different widths indicating separate regions of high and low concentrations of H atoms in the H2 matrix. Upon warming, the two components show very different rates of recombination with the higher density component having a faster recombination rate at T>1 K. We discuss the atomic interactions and mobility, and also the structure of the samples of H atoms in the H2 matrix.