Mechanistic studies of the decomposition of trimethylaluminum on heated surfaces
Mechanistic studies of the decomposition of trimethylaluminum on heated surfaces
复制标题
三甲基铝在受热表面分解的机理研究
DOI:
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发表时间:
1985
期刊:
影响因子:
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通讯作者:
M. Lin
中科院分区:
文献类型:
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作者:
D. Squire;C. Dulcey;M. Lin
The decomposition of trimethylaluminum (TMA) on copper, aluminum, quartz, and gallium arsenide substrates has been studied as a function of substrate temperature from 550–900 K under low pressure conditions. Detection of gaseous products was carried out by laser multiphoton ionization mass spectrometry (MPI/MS) for methyl radical and aluminum species and electron impact mass spectrometry (EI/MS) for stable species. The methyl radical was the sole gaseous reaction product observed above these substrates, with an apparent activation energy for production of 13±2 kcal/mol. Neither ethane nor methane was observed at the low pressures employed in these experiments, with either helium or hydrogen as carrier gases. A mechanism is proposed to explain these results.