Dynamics of the Liquid Microlayer Underneath a Vapor Bubble Growing at a Heated Wall
Dynamics of the Liquid Microlayer Underneath a Vapor Bubble Growing at a Heated Wall
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热壁上生长的蒸气泡下方液体微层的动力学
DOI：
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发表时间：
2013
期刊：
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通讯作者：
J. Buongiorno
中科院分区：
文献类型：
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作者：
A. Guion;D. Langewisch;J. Buongiorno
在气泡生长的初始（惯性控制）阶段中，在气泡下方形成的液体微层的蒸发可以是气泡生长的后期（热扩散控制）阶段中的重要蒸汽源。在文献中，该微层的表示通常限于气泡和壁之间的表观三相线（TPL）附近的非常短的（微米级）区域。然而，实验观察表明，微层实际上可以延伸超过TPL区域数百微米。根据这一观察，我们开发了一个简单的模型来预测扩展的微层的时间演化，以及相关的相应的蒸发速率和气泡下的热通量。该模型是作为完整的控制方程的一个特例导出的，它考虑了分离压力、毛细作用、蒸汽反冲和界面阻力的复杂影响。该模型的预测与实验观察到的微层行为在合理的定量一致。Copyright © 2013 by ASME
Evaporation of the liquid microlayer developing underneath a bubble in the initial (inertia controlled) phase of its growth can be a significant vapor source in the later (heat-diffusion controlled) phase of bubble growth. In the literature, representation of this microlayer is typically limited to a very short (order of microns) region near the apparent Triple Phase Line (TPL) between the bubble and the wall. However, experimental observations show that the microlayer may actually extend hundreds of microns beyond the TPL region. Guided by this observation, we develop a simple model to predict the time evolution of the extended microlayer, and the associated corresponding evaporation rate and heat flux underneath a bubble. The model is derived as a special case of the complete governing equations, which account for the complicated effects of disjoining pressure, capillarity, vapor recoil and interfacial resistance. The predictions of the model are in reasonable quantitative agreement with the experimentally observed behavior of the microlayer.Copyright © 2013 by ASME