Surface morphology of PS-PDMS diblock copolymer films
Surface morphology of PS-PDMS diblock copolymer films
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DOI：
10.1016/s0368-2048(01)00329-2
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发表时间：
2001-12-01
影响因子：
1.9
通讯作者：
Johannsen, I
中科院分区：
文献类型：
--
作者：
Andersen, TH;Tougaard, S;Johannsen, I
用X射线光电子能谱和原子力显微镜研究了聚苯乙烯-聚二甲基硅氧烷（PS-PDMS）二嵌段共聚物的旋涂薄膜（近似400埃）。聚（二甲基硅氧烷）嵌段的表面偏析进行了研究，为五个二嵌段共聚物，其分子量范围从7公斤/摩尔至500公斤/摩尔。在两个聚合物嵌段的最高玻璃化转变温度以上和以下，但低于有序-无序转变温度的薄膜进行退火。有关的信息的化学深度分布的薄膜中提取的X射线光电子能谱通过Tougaard方法的峰形分析。在薄膜的最上面部分中的二甲基硅氧烷的量被量化为退火时间和温度的函数。对于退火以上的PS玻璃化转变温度，表面偏析的二甲基硅氧烷链端发生的所有研究的PS-PDMS二嵌段共聚物。在室温下，只有当二嵌段共聚物中二甲基硅氧烷的量很小时，才发生表面偏析。(C)2001 Elsevier Science B. V.保留所有权利。
Spin coated thin films (similar to 400 Angstrom) of poly(styrene)- poly (dimethylsiloxane) (PS-PDMS) diblock copolymers have been investigated using X-ray Photoelectron Spectroscopy and Atomic Force Microscopy. Surface segregation of the poly(dimethylsiloxane) blocks was studied for five diblock copolymers which ranged in molecular weight from 7 kg/mol to 500 kg/mol. The films were annealed above and below the highest glass transition temperature of the two polymer blocks but below the order-disorder transition temperature. Information concerning the chemical in-depth distribution of the films was extracted by use of peak shape analysis of the X-ray Photoelectron Spectra via the Tougaard Method. The amount of dimethylsiloxane in the uppermost part of the films was quantified as a function of annealing time and temperature. For annealing above the PS glass transition temperature, surface segregation of the dimethylsiloxane chain-ends occurs for all the studied PS-PDMS diblock copolymers. At room temperature, surface segregation takes place only when the amount of dimethylsiloxane in the diblock copolymers is small. (C) 2001 Elsevier Science B.V. All rights reserved.