Deep levels and trapping mechanisms in chemical vapor deposited diamond
Deep levels and trapping mechanisms in chemical vapor deposited diamond
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化学气相沉积金刚石的深层能级和捕获机制
DOI:
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发表时间:
2002
期刊:
影响因子:
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通讯作者:
L. Lombardi
中科院分区:
文献类型:
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作者:
M. Bruzzi;D. Menichelli;S. Sciortino;L. Lombardi
Detector-grade undoped chemical vapor deposited (CVD) diamond samples have been studied with thermally stimulated currents (TSC) and photoinduced current transient spectroscopy (PICTS) analyses in the temperature range 300–650 K. Two previously unknown defects have been identified, characterized by activation energies E1=1.14 eV and E2=1.23 eV, cross sections of about σ≈10−13 cm2 and concentrations of Nt≈1016 cm−3. They have been clearly observed by PICTS and isolated in TSC measurements by use of a fractional annealing cycle in the temperature range 300–400 K. Due to their trap parameters, in particular the high cross section, the levels corresponding to E1 and E2 are characterized by capture times of the order of 10–100 ps. A dominant TSC peak observed at ≈500 K has been also investigated and has been resolved into four components with activation energies of the order of 1 eV and cross sections in the range 10−19–10−17 cm2. Three of these levels exhibit a fast capture rate (0.1–10 ns) in spite of their ...