Micro- and nanostructured poly[oligo(ethylene glycol)methacrylate] brushes grown from photopatterned halogen initiators by atom transfer radical polymerization
Micro- and nanostructured poly[oligo(ethylene glycol)methacrylate] brushes grown from photopatterned halogen initiators by atom transfer radical polymerization
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DOI：
10.1116/1.3553579
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发表时间：
2011-03-01
期刊：
影响因子：
2.1
通讯作者：
Chilkoti, Ashutosh
中科院分区：
文献类型：
--
作者：
Ahmad, Shah Alang;Leggett, Graham J.;Chilkoti, Ashutosh
光刻技术已用于制造聚合物刷微米和纳米结构。在波长为 244 nm 的紫外光照射下，二氧化硅上的氯甲基苯基三氯硅烷和 3-(2-溴异丁酰氨基)丙基三乙氧基硅烷薄膜中的卤素被选择性去除。通过使用掩模与入射激光束结合，可以实现微米级的图案化，而通过利用干涉光刻（IL），可以实现纳米级的图案化。由于去除了卤素，图案表面的摩擦力显微镜图像表现出摩擦对比度，但没有形貌对比度。在这两种情况下，卤化表面都用作表面原子转移自由基聚合的引发剂。通过紫外光刻对表面进行图案化，从而能够定义引发剂的图案，从中生长微米和纳米结构的聚[低聚(乙二醇)甲基丙烯酸酯]瓶刷。在两个表面上形成的微图案刷表现出优异的抗蛋白质吸附性，从而能够形成蛋白质图案。使用 IL，形成刷状结构，覆盖宏观区域（约 0.5 cm(2)），但半高全宽小至 78 nm，周期为 225 nm。因此，空间选择性光解去除固定在表面上的卤素似乎是一种简单、快速且通用的方法，用于形成微米和纳米结构聚合物刷以及控制蛋白质吸附。 (C) 2011 年美国真空协会。 [DOI：10.1116/1.3553579]
Photolithographic techniques have been used to fabricate polymer brush micro-and nanostructures. On exposure to UV light with a wavelength of 244 nm, halogens were selectively removed from films of chloromethylphenyltrichlorosilane and 3-(2-bromoisobutyramido)propyl-triethoxysilane on silicon dioxide. Patterning was achieved at the micrometer scale, by using a mask in conjunction with the incident laser beam, and at the nanometer scale, by utilizing interferometric lithography (IL). Friction force microscopy images of patterned surfaces exhibited frictional contrast due to removal of the halogen but no topographical contrast. In both cases the halogenated surface was used as an initiator for surface atom-transfer radical polymerization. Patterning of the surface by UV lithography enabled the definition of patterns of initiator from which micro-and nanostructured poly[oligo(ethylene glycol)methacrylate] bottle brushes were grown. Micropatterned brushes formed on both surfaces exhibited excellent resistance to protein adsorption, enabling the formation of protein patterns. Using IL, brush structures were formed that covered macroscopic areas (approximately 0.5 cm(2)) but exhibited a full width at half maximum height as small as 78 nm, with a period of 225 nm. Spatially selective photolytic removal of halogens that are immobilized on a surface thus appears to be a simple, rapid, and versatile method for the formation of micro-and nanostructured polymer brushes and for the control of protein adsorption. (C) 2011 American Vacuum Society. [DOI: 10.1116/1.3553579]