Detection of quasimolecular ion of Cu(hfac)(tmvs) by ion attachment mass spectrometry
Detection of quasimolecular ion of Cu(hfac)(tmvs) by ion attachment mass spectrometry
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离子附着质谱法检测Cu(hfac)(tmvs)准分子离子
DOI:
10.1116/1.1798751
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发表时间:
2004
期刊:
影响因子:
--
通讯作者:
M. Nakata
中科院分区:
文献类型:
--
作者:
Megumi Nakamura;Y. Shiokawa;T. Fujii;M. Takayanagi;M. Nakata
A molecular ion of (trimethylvinylsilane)(1,1,1,5,5,5-hexafluoroacetyl-acetonato)Cu(I) [Cu(hfac)(tmvs)], which could not be detected by mass spectrometry with conventional ionization techniques such as electron impact ionization because of weak coordination bonds, has been successfully detected as a quasimolecular ion, Cu(hfac)(tmvs)Li+, for the first time by recently developed ion-attachment mass spectrometry (IAMS). Cu(hfac)(tmvs) is a material widely used in the metal organic chemical vapor deposition (MOCVD) process. In the thermal decomposition of Cu(hfac)(tmvs), trimethylvinylsilane (tmvs) and hexafluoroacetylacetone (Hhfac) were observed by IAMS as the reaction products. We also evaluated the dependence of the decomposition process on temperature. We found IAMS to be an effective tool in monitoring and clarifying MOCVD processes.