Generating Sub-Micron Features On Rough Surfaces Using Optical Trap Assisted Nanopatterning
Generating Sub-Micron Features On Rough Surfaces Using Optical Trap Assisted Nanopatterning
复制标题
使用光阱辅助纳米图案化在粗糙表面上生成亚微米特征
DOI：
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发表时间：
2010
期刊：
影响因子：
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通讯作者：
C. Arnold
中科院分区：
文献类型：
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作者：
Y. Tsai;R. Fardel;C. Arnold
近场强度增强使激光修饰特征尺寸低于经典衍射极限的材料。然而，尽管在许多情况下需要在粗糙或结构表面上产生亚微米特征，但由于需要保持物镜元件和基板之间的近距离，通常限制了该技术在平面上的演示。在这里，我们展示了一种新技术的使用，光学陷阱辅助纳米图案（OTAN），用于波纹衬底上的纳米级特征的生产。在不需要主动反馈和控制的情况下，将微珠近场物镜定位在接近表面的位置，这使得人们可以在粗糙的表面上连续移动微珠而不会被粘住。聚酰亚胺的亚微米图案在1.1 μm的表面上显示出良好的均匀性。最后，启用技术允许直接并行化，其中多个模式可以在…
Near‐field intensity enhancement enables laser modification of materials with feature sizes below the classical diffraction limit. However, the need to maintain close distances between the objective element and the substrate typically limit demonstrations of this technology to flat surfaces, even though there are many cases where the ability to produce sub‐micron features on rough or structured surfaces are needed. Here, we show the use of a new technique, optical trap assisted nanopatterning (OTAN), for the production of nanoscale features on rippled substrates. The ability to position a microbead near‐field objective close to the surface without the need for active feedback and control allows one to continuously move the bead across a rough surface without sticking. Sub‐micron patterning of polyimide is demonstrated on surfaces with 1.1 μm steps showing good uniformity. Finally, the enabling technology allows for straightforward parallelization where multiple patterns can be created simultaneously over ...