Properties of LaAlO3 thin film on GaAs(1 0 0) treated by in situ NH3 plasma
Properties of LaAlO3 thin film on GaAs(1 0 0) treated by in situ NH3 plasma
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DOI：
10.1016/j.nimb.2013.01.079
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发表时间：
2013-07
影响因子：
1.3
通讯作者：
Tingting Jia;Xingwen Cheng;D. Chao;Dawei Xu;Z. Wang;C. Xia;Youwei Zhang;Yunjin Yu
中科院分区：
文献类型：
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作者：
Tingting Jia;Xingwen Cheng;D. Chao;Dawei Xu;Z. Wang;C. Xia;Youwei Zhang;Yunjin Yu
