Nanoscale Engineering and Optical Addressing of Single Spins in Diamond
Nanoscale Engineering and Optical Addressing of Single Spins in Diamond
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DOI:
10.1002/smll.201000902
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发表时间:
2010-10-04
期刊:
影响因子:
13.3
通讯作者:
Meijer, Jan
中科院分区:
文献类型:
--
作者:
Pezzagna, Sebastien;Wildanger, Dominik;Meijer, Jan
Sébastien Pezzagna,* Dominik Wildanger, Paul Mazarov, Andreas D. Wieck, Yanko Sarov, Ivo Rangelow, Boris Naydenov, Fedor Jelezko, Stefan W. Hell, and Jan Meijer of the negatively charged state consists of triplet ground and first excited states. Strong optical transition between these triplets (fluorescence lifetime− 11.5 ns) allows detection of single centres via fluorescence microscopy. Owing to unprecedented photostability of defects, they become a model system for resolution test of novel microscopy techniques like stimulated emission depletion microscopy (STED)[12] or ground state depletion microscopy (GSD).[13] It is crucial for technological applications that color centres can be created using implantation of single nitrogen atoms into diamond lattice followed by annealing. First implantation experiments [14, 15] have shown that two major issues related to the creation of color centres need to be addressed:(a) spatial resolution and (b) yield of creation of color centres. Implantation technique has intrinsic limitation on defects positioning accuracy arising from straggling of nitrogen in diamond lattice during implantation. Low (a few keV) energy is necessary for achieving a positioning accuracy in the nanometer range, however the yield of conversion of nitrogen to nitrogen-vacancy centres during annealing is low in this case [16](a few percents, due to an insufficient number of vacancies, to surface trapping of vacancies during annealing,[17] and to higher NV/NV− ratio). Shallow NV centres produced close to the surface also find promising applications as ultrasensitive, nanoscale magnetic sensors.[18–20] Recently it was shown that post-processing of diamond via implantation of carbon allows improving conversion efficiency.[21] Here we show that high spatial accuracy of NV implantation can be realised using novel implantation technology. Since dopants are buried into the diamond lattice, scanning probe techniques like AFM or STM cannot be used to characterise the created arrays. We show that nanometer scale mapping of single implanted atoms can be done using far-field optical STED microscopy. A scheme of the implantation and measurement procedures is presented in Figure 1. Collimating and positioning of the nitrogen beam are combined within the hollow tip of an atomic force microscope. In a first experiment, a pierced tip with a hole diameter≥ 100 nm was used. Different patterns were implanted in a high purity diamond (12C enriched, Element 6) with 5 keV 15N+ ions and with fluences ranging from 1× 10 11 to 3.3× 10 13 cm− 2. Due to the low creation efficiency of NV centres at low energy, only the high fluences resulted in clearly visible patterns. The confocal scan in Figure 1 shows a hexagonal pattern (500 nm between each spot) implanted with a fluence of 1× 10 13 cm− 2 per spot. One DOI: 10.1002/smll. 201000902