Tuning the magnetic properties of Fe thin films with RF-sputtered amorphous carbon
Tuning the magnetic properties of Fe thin films with RF-sputtered amorphous carbon
复制标题
用射频溅射非晶碳调节铁薄膜的磁性能
DOI：
10.1016/j.jmmm.2022.169461
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发表时间：
2022
影响因子：
2.7
通讯作者：
Alghamdi S
中科院分区：
文献类型：
--
作者：
Alghamdi S
射频溅射非晶碳（a-C）提供了一种简单而廉价的途径来调整过渡金属薄膜的磁性能，用于磁存储器和不同的自旋电子学应用。本文描述了具有a-C覆盖层的铁薄膜的磁性能的变化。在沉积态样品中，Fe/a-C界面处的杂化和混合导致磁性软化（Liu等人，2006）[1]，对于Fe/a-C/Fe三层，矫顽场（Hc）降低高达五倍，并且作为金属膜厚度的函数，饱和磁化强度降低10-30%。在500 °C下退火后，碳层的相互扩散和石墨化导致高达五倍的增加的导电性，这是由于增加的钉扎，如通过克尔显微镜所示。因此，RF溅射碳覆盖层和后处理可以在简单、廉价和可持续的合成方法中调节金属薄膜的各向异性和畴配置。
RF-sputtered amorphous carbon (a-C) offers a simple and cheap pathway to tune the magnetic properties of transition metal thin films for magnetic memories and different spintronic applications. This paper describes changes in the magnetic properties of iron thin films with a-C overlayers. In as-deposited samples, hybridisation and intermixing at the Fe/a-C interface leads to magnetic softening (Liu et al., 2006) [1], with a reduction in the coercive field (Hc) up to a factor of five for Fe/a-C/Fe trilayers, and a 10–30% lower saturation magnetization as a function of the metal film thickness. After annealing at 500 °C, inter-diffusion and graphitization of the carbon layer results in up to a factor five increased coercivity due to increased pinning as shown via Kerr microscopy. Therefore, RF-sputtered carbon overlayers and post-processing can tune the anisotropy and domain configuration of metallic thin films in a synthesis methodology that is simple, cheap and sustainable.