Directed Gas Phase Formation of Silene (H 2 SiCH 2 )
Directed Gas Phase Formation of Silene (H 2 SiCH 2 )
复制标题
硅烷(H 2 SiCH 2 )的定向气相形成
DOI:
10.1002/chem.202002359
复制
发表时间:
2020
期刊:
影响因子:
--
通讯作者:
Kaiser, Ralf I.
中科院分区:
文献类型:
--
作者:
Yang, Zhenghai;Doddipatla, Srinivas;He, Chao;Krasnoukhov, Vladislav S.;Azyazov, Valeriy N.;Mebel, Alexander M.;Kaiser, Ralf I.
The silene molecule (H2SiCH2; X1A1) has been synthesized under single collision conditions via the bimolecular gas phase reaction of ground state methylidyne radicals (CH) with silane (SiH4). Exploiting crossed molecular beams experiments augmented by high‐level electronic structure calculations, the elementary reaction commenced on the doublet surface through a barrierless insertion of the methylidyne radical into a silicon‐hydrogen bond forming the silylmethyl (CH2SiH3; X2A′) complex followed by hydrogen migration to the methylsilyl radical (SiH2CH3; X2A′). Both silylmethyl and methylsilyl intermediates undergo unimolecular hydrogen loss to silene (H2SiCH2; X1A1). The exploration of the elementary reaction of methylidyne with silane delivers a unique view at the widely uncharted reaction dynamics and isomerization processes of the carbon–silicon system in the gas phase, which are noticeably different from those of the isovalent carbon system thus contributing to our knowledge on carbon silicon bond couplings at the molecular level.