The 19F chemical shift in oxygen containing carbon fluorine products
The 19F chemical shift in oxygen containing carbon fluorine products
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含氧碳氟产物中的19F化学位移
DOI：
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发表时间：
1969
期刊：
影响因子：
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通讯作者：
D. Sianesi
中科院分区：
文献类型：
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作者：
F. Ciampelli;M. Venturi;D. Sianesi
我们已经研究了一些含氧氟碳化合物的19F NMR光谱，并获得了一套全面的19F化学位移值，这使我们能够确定氧原子键合到氟碳化合物基团上的19F化学位移的影响。相邻的碳氟化合物基团的影响，无论是直接连接或分离的氧原子，也被认为是。
我们的结果可以总结如下。通过单键（醚型键）与氟取代的碳原子键合的氧原子降低19F化学位移，引入另外的氟原子也是如此。考虑到两个相邻的碳氟化合物基团，两个基团之一的19F化学位移的x ppm的变化在另一个基团的19F化学位移的相反意义上给出0·12 x ppm的变化。如果两个基团通过醚氧原子连接，则影响仅为约0·06 x ppm。
We have examined the 19F NMR spectra of a number of oxygen-containing fluorocarbon products and obtained a comprehensive set of 19F chemical shift values, which enabled us to determine the influence of an oxygen atom bonded to a fluorocarbon group on the 19F chemical shift. The influence of neighbouring fluorocarbon groups, either directly connected or separated by an oxygen atom, was also considered.
Our results may be summarized as follows. An oxygen atom bonded by a single bond (ether type bond) to a fluorine substituted carbon atom decreases the 19F chemical shift, as does the introduction of a further fluorine atom. Considering two adjacent fluorocarbon groups, a variation of x ppm in the 19F chemical shift of one of the two groups gives a variation of 0·12 x ppm in the opposite sense on the 19F chemical shift of the other group. If the two groups are connected by an ether oxygen atom, the effect is only about 0·06 x ppm.