Photodegradation of Organosilane Self-assembled Monolayers Irradiated with an Excimer Lamp
Photodegradation of Organosilane Self-assembled Monolayers Irradiated with an Excimer Lamp
复制标题
准分子灯照射下有机硅烷自组装单层膜的光降解
DOI：
10.2494/photopolymer.13.69
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发表时间：
2000
影响因子：
0.8
通讯作者：
O. Takai
中科院分区：
文献类型：
--
作者：
H. Sugimura;Takashi Shimizu;O. Takai
用波长为172 nm的真空紫外光照射有机硅烷自组装膜（SAMs），研究了SAMs在大气氧分子存在下的光降解。自组装膜是在硅基片上制备的，硅基片上覆盖有来自十八烷基三甲氧基硅烷[CH 3（CH 2）17 Si（OCH 3）3，ODS]的前体分子的天然氧化物。这些自组装膜中的每一个在10至105 Pa的控制压力下被光照射。水接触角测量，红外反射吸收光谱和X射线光电子能谱证实，自组装膜被分解和去除，由于真空紫外照射。这种光降解机制归因于ODS分子中C-C和C-H键的解离激发，以及随后与O2分子的VUV照射同时产生的原子氧自由基进行氧化。这种有机硅烷SAM的VUV-降解，此外，适用于光刻，其中SAM作为光致抗蚀剂。用一种简单的光掩模接触法成功地在Si衬底上转移了2μm宽的微图形。
Photodegradation of organosilane self-assembled monolayers (SAMs), under the presence of atmospheric oxygen molecules, has been studied using an excimer lamp radiating vacuum ultra-violet (VUV) light of 172nm in wavelength. The SAMs were prepared on Si substrates covered with native oxide from a precursor molecule of octadecyltrimethoxysilane [CH3(CH2)17Si(OCH3)3, ODS]. Each of these SAMs was photoirradiated under a controlled pressure from 10 to 105Pa. As confirmed by water contact angle measurements, infrared reflection-absorption spectroscopy and X-ray photoelectron spectroscopy, the SAMs were decomposed and removed due to the VUV-irradiation. This photodegradation mechanism is ascribed to dissociative excitation of C-C and C-H bondings in the ODS molecules and to subsequently proceeded oxidation with atomic oxygen radicals generated simultaneously by the VUV-irradiation of O2 molecules. This VUV-degradation of organosilane SAM was, furthermore, applied to to photolithography in which the SAM served as photoresist. A micropattern of 2μm in width was successfully transferred on the Si substrate by a simple photomask-contacting method.