Plasmonic nanocomposites of zinc oxide and titanium nitride

Plasmonic nanocomposites of zinc oxide and titanium nitride
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DOI:
10.1116/1.5142858
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发表时间:
2020-06
期刊:
Journal of Vacuum Science and Technology
影响因子:
--
通讯作者:
Chad A. Beaudette;Jacob T. Held;B. Greenberg;Phong H. Nguyen;Nolan M. Concannon;R. Holmes;K. Mkhoyan;E. Aydil;U. Kortshagen
Chad A. Beaudette;Jacob T. Held;B. Greenberg;Phong H. Nguyen;Nolan M. Concannon;R. Holmes;K. Mkhoyan;E. Aydil;U. Kortshagen
中科院分区:
其他
文献类型:
--
作者:
Chad A. Beaudette;Jacob T. Held;B. Greenberg;Phong H. Nguyen;Nolan M. Concannon;R. Holmes;K. Mkhoyan;E. Aydil;U. Kortshagen

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作者通过将等离子体合成的 ZnO 纳米晶体沉积到基底上,然后通过远程等离子体增强原子层沉积 (PEALD) 用 TiN 填充纳米晶体网络的孔隙,从而生产等离子体 ZnO-TiN 纳米复合材料薄膜。这种 ZnO-TiN 纳米复合材料表现出与平面氮化钛薄膜相比蓝移的等离子体共振。作者研究了 PEALD 条件和 ZnO 薄膜厚度对这些纳米复合材料等离子体响应的影响,并在零偏压下产生光电流的设备中开发了优化薄膜。
The authors produce plasmonic ZnO-TiN nanocomposite films by depositing plasma-synthesized ZnO nanocrystals onto a substrate and then by infilling the nanocrystal network's pores with TiN via remote plasma-enhanced atomic layer deposition (PEALD). This ZnO-TiN nanocomposite exhibits a plasmonic resonance that is blueshifted compared to planar titanium nitride thin films. The authors study the effects of PEALD conditions and the ZnO film thickness on the plasmonic response of these nanocomposites and exploit the optimized film in a device that generates photocurrent at zero bias.