Methylamine Adsorption on and Desorption from Si(100)

Methylamine Adsorption on and Desorption from Si(100)
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甲胺在 Si(100) 上的吸附和解吸

DOI:
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发表时间:
2003
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通讯作者:
S. Casey
S. Casey
中科院分区:
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作者:
A. Carman;Linhuan Zhang;and Jason L. Liswood;S. Casey

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利用俄歇电子能谱(AES)、热脱附谱(TDS)、低能电子衍射和计算模拟研究了几种简单甲胺在Si(100)-(2 × 1)表面的吸附。甲胺和二甲胺似乎在室温下在该表面上经历大多数解离吸附,尽管捕获到分子吸附井似乎在有限的程度上发生两种分子。三甲基胺似乎主要是分子吸附在这个表面上。这些结果与最近的计算,红外和光电子能谱研究这些系统是一致的。通过与碘甲烷在Si(100)上吸附的AES结果的比较,得出结论,三甲胺在Si(100)上的表面饱和覆盖度为0.26单层,与光电发射结果一致,而甲胺和二甲胺似乎在约0.48单层处饱和。TDS揭示了母体解吸化学...
The adsorption of several simple methylamines on the Si(100)-(2 × 1) surface has been investigated using Auger electron spectroscopy (AES), thermal desorption spectroscopy (TDS), low-energy electron diffraction, and computational modeling. Both methylamine and dimethylamine appear to undergo mostly dissociative adsorption on this surface at room temperature, although trapping into a molecular adsorption well appears to occur to a limited extent for both molecules. Trimethylamine appears to undergo mostly molecular adsorption on this surface. These results are in agreement with recent computational, infrared, and photoemission spectroscopic studies of these systems. By comparison to the AES results from the adsorption of methyl iodide on Si(100), it was concluded that the surface saturation coverage of trimethylamine on Si(100) is 0.26 monolayers, consistent with the photoemission results, while both methylamine and dimethylamine appear to saturate at about 0.48 monolayers. TDS reveals parent desorption ch...