Compact sputter source for deposition of small size-selected clusters
Compact sputter source for deposition of small size-selected clusters
复制标题
用于沉积小尺寸选定簇的紧凑型溅射源
DOI：
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发表时间：
1997
期刊：
影响因子：
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通讯作者：
R. Palmer
中科院分区：
文献类型：
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作者：
S. G. Hall;M. B. Nielsen;A. W. Robinson;R. Palmer
我们报道了用于产生小质量选择原子团的铯离子溅射源的发展。它的设计紧凑和便携，使其能够连接到超高真空(UHV)系统，用于沉积实验。由高能(∼20keV)原子离子束源发展而来的溅射源，通过引入束流引出部分进行了改进，获得了1.5kV的束流能量。这允许使用紧凑型维恩速度过滤器进行质量选择，从而极大地减小了震源的尺寸。该源能产生足够强度的小团簇(1-15个原子/团)用于超高真空沉积实验，例如，在1 cm~2的面积上，Al_7−的沉积速率为0.002单分子层/分钟。有可能产生多种材料的光束，特别是贵金属和碳。我们给出了AgN−、AlN−和CN−团簇的质谱图。
We report on the development of a caesium ion sputter source for the production of small mass-selected atomic clusters. It has been designed to be compact and portable, enabling it to be attached to ultrahigh vacuum (UHV) systems for use in deposition experiments. The sputter source, developed from a high energy (∼20 keV) atomic ion beam source, has been modified by introducing a beam extraction section, resulting in a cluster beam energy of 1.5 kV. This allows mass selection to be performed with a compact Wien velocity filter, greatly reducing the dimensions of the source. The source produces sufficient intensities of small clusters (1 – 15 atoms/cluster) for UHV deposition experiments, for example, a deposition rate of 0.002 monolayers/min for Al7− focused onto a 1 cm2 area has been obtained. It is possible to produce beams of many materials, especially the noble metals and carbon. We show mass spectra for Agn −, Aln− , and Cn− clusters.