The van der Waals potential between metastable atoms and solid surfaces: Novel diffraction experiments vs. theory
The van der Waals potential between metastable atoms and solid surfaces: Novel diffraction experiments vs. theory
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亚稳态原子和固体表面之间的范德华势：新颖的衍射实验与理论
DOI：
10.1209/epl/i2002-00202-4
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发表时间：
2001
期刊：
影响因子：
1.8
通讯作者：
Christian Walter
中科院分区：
文献类型：
--
作者：
R. Bruehl;P. Fouquet;R. Grisenti;J. Toennies;G. C. Hegerfeldt;T. Koehler;M. Stoll;Christian Walter
高极化亚稳态 He* (23S) 和 Ne* (23P) 原子已从 100 nm 周期氮化硅透射光栅中衍射出来，并根据 10 阶衍射强度确定了激发原子与氮化硅表面相互作用的范德华系数 C3。结果与基于非延迟 Lifshitz 公式的计算结果一致。
Highly polarizable metastable He* (23S) and Ne* (23P) atoms have been diffracted from a 100 nm period silicon nitride transmission grating and the van der Waals coefficients C3 for the interaction of the excited atoms with the silicon nitride surface have been determined from the diffraction intensities out to the 10th order. The results agree with calculations based on the non-retarded Lifshitz formula.