TiSiCN and TiAlVSiCN nanocomposite coatings deposited from Ti and Ti-6Al-4V targets
TiSiCN and TiAlVSiCN nanocomposite coatings deposited from Ti and Ti-6Al-4V targets
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DOI：
10.1016/j.surfcoat.2017.10.009
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发表时间：
2017-10
影响因子：
5.4
通讯作者：
Jianliang Lin;R. Wei;F. Ge;Y. Li;Xuhai Zhang;F. Huang;M. Lei
中科院分区：
文献类型：
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作者：
Jianliang Lin;R. Wei;F. Ge;Y. Li;Xuhai Zhang;F. Huang;M. Lei
在Ar + N2+三甲基硅烷（TMS）混合气体中，分别用脉冲直流磁控溅射纯Ti靶和工业级Ti-6Al-4V靶制备了TiSiCN和TiAlVSiCN涂层。通过将TMS流速（fTMS）从0增加到4sccm来改变涂层的元素组成。本研究的主要目的是探索使用低成本的商业级Ti-6Al-4V材料作为Ti的溅射源来沉积Ti基纳米结构涂层的可能性。采用X射线衍射、X射线光电子能谱（XPS）和透射电子显微镜（TEM）对涂层的微观结构进行了表征。采用纳米压痕法、干球-盘磨损试验和固体颗粒冲蚀磨损试验对涂层的力学性能、抗滑动磨损性能和抗冲蚀磨损性能进行了分析。在相似的沉积条件下，TiAlVSiCN涂层的沉积速率比TiSiCN涂层的沉积速率更高（增加35-59%）。随着fTMS的增加，两种涂层系统表现出相似的结构演变，从细柱状晶结构的纳米复合结构，最后到非晶状结构。直接从Ti-6Al-4V靶材向TiAlVSiCN涂层中引入少量Al和V有利于改善涂层的机械性能、耐磨性和耐冲蚀性。研究表明，采用工业级Ti-6Al-4V材料作为Ti溅射源沉积Ti基纳米结构涂层，可以提高沉积速率，改善涂层性能，降低生产成本。
TiSiCN and TiAlVSiCN coatings were deposited by pulsed dc magnetron sputtering of a pure Ti target and a commercial grade Ti-6Al-4V target, respectively, in an Ar + N2+ trimethylsilane (TMS) mixture. The elemental composition of the coatings was varied by increasing the TMS flow rate (fTMS) from 0 to 4 sccm. The main goal of the study is to explore the possibility of using low cost commercial grade Ti-6Al-4V material as a sputtering source of Ti for depositing Ti based nanostructure coatings. The microstructure of the coatings was characterized using X-ray diffraction, X-ray photoelectron spectroscopy (XPS), and transmission electron microscopy (TEM). The mechanical properties, sliding wear and erosion resistances of the coatings were analyzed using nanoindentation, dry ball-on-disc test, and solid particle erosion, respectively. Higher deposition rates (35–59% increase) were observed for the TiAlVSiCN coatings than those for the TiSiCN coatings under similar deposition conditions. As the fTMSis increased, both coating systems exhibit similar structural evolution from fine columnar grain structure to nanocomposite structure, and finally to amorphous-like structure. The incorporation of a small amount of Al and V into the TiAlVSiCN coatings directly from the Ti-6Al-4V target is beneficial for improving the mechanical properties, wear resistance, and erosion resistance of the coatings. The study demonstrates that it is practical to use commercial grade Ti-6Al-4V material as a sputtering source of Ti for depositing Ti-based nanostructure coatings to achieve higher deposition rates, improved properties and lower production cost.