Low-cost dual cocatalysts BiVO4 for highly efficient visible photocatalytic oxidation

Low-cost dual cocatalysts BiVO4 for highly efficient visible photocatalytic oxidation
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用于高效可见光催化氧化的低成本双助催化剂 BiVO4

DOI:
10.1039/c6ra27559a
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发表时间:
2017-01-01
期刊:
影响因子:
3.9
通讯作者:
Dong, Bin
Dong, Bin
中科院分区:
化学3区
文献类型:
--
作者:
Lin, Feng;Shao, Zhiyu;Dong, Bin

文献摘要

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贵金属助催化剂在提高水裂解和污染物降解反应的光催化活性方面发挥了重要作用。贵金属的高价格限制了它们在工业上的进一步应用。本文首次报道了以分子氧为氧化剂,在可见光照射下,噻吩、罗丹明B (RhB)和甲基橙(MO)在共载Ni和CuO助催化剂(Ni - CuO/BiVO4)的BiVO4上被高效氧化。此外,0.05 wt% Ni-0.5 wt% CuO/BiVO4具有较高的光催化活性(噻吩转化率超过94%),接近Pt-RuO2 /BiVO4(噻吩转化率99%)。XPS和ESR测试表明,BiVO4与Ni/Cu和CuO/Cu2O共载催化剂同时发生了分子氧的活化和污染物分子的氧化。光催化活性的显著增强可归因于还原助催化剂Ni/Cu和氧化助催化剂CuO/Cu2O的同时存在,这有利于光生电子和空穴的有效分离和转移。这种负载丰富的双助催化剂的可见光响应半导体在太阳能转换和进一步的工业应用方面都有很大的潜力。
The cocatalysts of noble metals are reported to play a significant role in improving the photocatalytic activity in water splitting and pollutant degradation reactions. The high price of noble metals limits their further application in industry. Herein, for the first time, we report that thiophene, rhodamine B (RhB) and methyl orange (MO) can be efficiently oxidized on BiVO4 co-loaded with Ni and CuO cocatalysts (denoted as Ni–CuO/BiVO4) under visible light irradiation with molecular oxygen as the oxidant. Moreover, 0.05 wt% Ni–0.5 wt% CuO/BiVO4 possesses high photocatalytic activity (over 94% conversion of thiophene), which is close to Pt–RuO2/BiVO4 (99% conversion of thiophene). XPS and ESR measurements showed that the activation of molecular oxygen and oxidation of pollutant molecules simultaneously take place on BiVO4 co-loaded with Ni/Cu and CuO/Cu2O cocatalysts. The considerable enhancement of photocatalytic activity can be attributed to the simultaneous presence of the reduction cocatalyst Ni/Cu and oxidation cocatalyst CuO/Cu2O, which are beneficial for the efficient separation and transfer of the photo-generated electrons and holes. Such visible-light-responsive semiconductor loaded with earth-abundant dual cocatalysts has great potential in both solar energy conversion and further industrial applications.