Ultra-low-loss integrated visible photonics using thin-film lithium niobate
Ultra-low-loss integrated visible photonics using thin-film lithium niobate
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DOI:
10.1364/optica.6.000380
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发表时间:
2019-03-20
期刊:
影响因子:
10.4
通讯作者:
Loncar, Marko
中科院分区:
文献类型:
--
作者:
Desiatov, Boris;Shams-Ansari, Amirhassan;Loncar, Marko
Integrated photonics is a powerful platform that can improve the performance and stability of optical systems while providing low-cost, small-footprint, and scalable alternatives to implementations based on free-space optics. While great progress has been made on the development of low-loss integrated photonics platforms at telecom wavelengths, the visible wavelength range has received less attention. Yet, many applications utilize visible or near-visible light, including those in optical imaging, optogenetics, and quantum science and technology. Here we demonstrate an ultra-low-loss integrated visible photonics platform based on thin-film lithium niobate on an insulator. Our waveguides feature ultra-low propagation loss of 6 dB/m, while our microring resonators have an intrinsic quality factor of 11 million, both measured at 637 nm wavelength. Additionally, we demonstrate an on-chip visible intensity modulator with an electro-optic bandwidth of 10 GHz, limited by the detector used. The ultra-low-loss devices demonstrated in this work, together with the strong second-and third-order nonlinearities in lithium niobate, open up new opportunities for creating novel passive and active devices for frequency metrology and quantum information processing in the visible spectrum range. (C) 2019 Optical Society of America under the terms of the OSA Open Access Publishing Agreement