Uniform nanohole patterning by high intensity near field ablation with nanoparticle arrays obliquely irradiated with femtosecond laser
Uniform nanohole patterning by high intensity near field ablation with nanoparticle arrays obliquely irradiated with femtosecond laser
复制标题
飞秒激光倾斜照射纳米颗粒阵列，通过高强度近场烧蚀实现均匀纳米孔图案
DOI：
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发表时间：
2011
期刊：
影响因子：
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通讯作者：
Minoru Obara
中科院分区：
文献类型：
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作者：
Tomoya Miyanishi;Mitsuhiro Terakawa;Minoru Obara
