Pulse electrochemical polishing for microrecesses based on a coulostatic analysis
Pulse electrochemical polishing for microrecesses based on a coulostatic analysis
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DOI：
10.1007/s00170-008-1391-y
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发表时间：
2009-02
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影响因子：
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通讯作者：
Jeong-Woo Park;Deug-Woo Lee
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文献类型：
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作者：
Jeong-Woo Park;Deug-Woo Lee
使用脉冲电流的电化学抛光是一种潜在的替代工艺，用于抛光脉冲电化学加工产生的微图形或微凹槽。与基于连续电流的传统电化学抛光工艺相比，脉冲电化学抛光工艺很有吸引力，因为它们允许通过施加超短电压脉冲进行瞬时电化学反应。然而，很少有人尝试计算电化学过程的较佳脉冲持续时间。为了预测较佳的脉冲宽度，需要从双电层的充放电分析中获得比极化电阻和时间常数。这项研究描述了一种控制物理和电气条件的方法，以获得抛光的微图案或微凹陷，具有光泽和光滑的表面，同时保持其原始的微尺度形状。
Electrochemical polishing using a pulsing current is a potential alternative process for polishing micro patterns or microrecesses generated by pulse electrochemical machining. Pulse electrochemical polishing processes are attractive compared to conventional electrochemical polishing processes based on a continuous current because they allow instantaneous electrochemical reaction by applying ultrashort voltage pulses. However, there have been few attempts for calculating preferable pulse durations of the electrochemical process. To predict the preferable pulse durations, the specific polarization resistance and time constant should be obtained from a charging/discharging analysis of electrical double layer. This study describes a means of controlling physical and electrical conditions to achieve polished micro pattern or microrecess with lustrous and smooth surfaces while maintaining their original micro-scale shapes.