Measurement configuration optimization for grating reconstruction by Mueller matrix polarimetry
Measurement configuration optimization for grating reconstruction by Mueller matrix polarimetry
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DOI：
10.1117/12.2011487
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发表时间：
2013-04
期刊：
影响因子：
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通讯作者：
Xiuguo Chen;Shiyuan Liu;Chuanwei Zhang;Hao Jiang
中科院分区：
文献类型：
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作者：
Xiuguo Chen;Shiyuan Liu;Chuanwei Zhang;Hao Jiang
作为一种非成像光学测量技术，光谱Mueller矩阵偏振测量（MMP）已被引入到临界尺寸（CD）和重叠测量中，并取得了巨大的成功。由于米勒矩阵提供的附加信息时，最一般的锥形衍射配置被认为是，MMP已被证明在半导体制造的巨大潜力。为了充分利用Mueller矩阵提供的附加信息，优化测量配置对MMP具有重要意义。在本文中，我们引入了一个配置误差传播矩阵的范数作为成本函数，以优化光谱MMP的测量配置，目的是找到一个固定的入射角和方位角的最佳组合，这提供了更高的测量精度。通过在入射角和方位角的有效范围内最小化配置误差传播矩阵的范数，可以获得最优的测量配置。在双旋转补偿Mueller矩阵偏振仪上进行的实验验证了所提出的测量结构优化方法的有效性。
As a non-imaging optical measurement technique, spectroscopic Mueller matrix polarimetry (MMP) has been introduced for critical dimension (CD) and overlay metrology with recent great success. Due to the additional information provided by the Mueller matrices when the most general conical diffraction configuration is considered, MMP has demonstrated a great potential in semiconductor manufacturing. In order to make full use of the additional information provided by the Mueller matrices, it is of great importance for MMP to optimize the measurement configuration. In this paper, we introduce the norm of a configuration error propagating matrix as the cost function to optimize the measurement configuration for spectroscopic MMP with the aim of finding an optimal combination of fixed incidence and azimuthal angles, which provides higher measurement accuracy. The optimal measurement configuration can be achieved by minimizing the norm of the configuration error propagating matrix in the available ranges of incidence and azimuthal angles. Experiments performed on a silicon grating with a dual-rotating compensator Mueller matrix polarimeter have demonstrated the validity of the proposed measurement configuration optimization method.