Acid generation and acid diffusion in photoresist films
Acid generation and acid diffusion in photoresist films
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光刻胶薄膜中的酸生成和酸扩散
DOI：
10.1117/12.59751
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发表时间：
1992
期刊：
影响因子：
--
通讯作者：
S. Macdonald
中科院分区：
文献类型：
--
作者：
D. R. Mckean;R. Allen;P. H. Kasai;U. Schaedeli;S. Macdonald
三芳基磺酸盐作为酸性光发生器已广泛应用于化学放大光刻胶中。开发了一种技术，用于测量含有磺胺盐的聚合物薄膜辐照时产生的酸的量，这些测量结果用于了解酸化学对酸催化抗蚀剂光刻性能的重要性。电子束和紫外线照射的结果表明，极性效应是决定产酸效率的重要因素。研究了磺酸盐负荷量对产酸效率的影响。对含硫盐聚合物薄膜的热分析表明，硫盐在极性聚合物薄膜中的塑化作用更大，表明硫盐与聚合物的相互作用对极性聚合物更好。ESR实验已经确定了辐照后产生的自由基的性质，这些结果表明对聚合物结构效应的机理理解。在酸敏感聚合物的情况下，已经有可能确定酸催化化学的程度，这反过来又提供了一种估计酸在该聚合物薄膜中的扩散范围的方法。
Triarylsulfonium salts have been widely used as acid photogenerators in chemically amplified photoresists. A technique was developed for measuring the amount of acid which is generated on irradiation of polymer films containing sulfonium salts and the results of these measurements were used to obtain an understanding of the importance of acid chemistry on the lithographic performance of acid-catalyzed resists. The results from both electron beam and ultraviolet irradiations suggest that polarity effects are very important factors in determining the efficiency of acid generation. The effect of sulfonium salt loading percentage on acid generating efficiency was also studied. Thermal analysis of polymer films containing sulfonium salts has shown greater plasticization effects for sulfonium salts in polar polymer films indicating that the interaction between sulfonium salts and polymers is better for polar polymers. ESR experiments have determined the nature of the radicals which are produced following irradiation and these results suggest a mechanistic understanding of the polymer structural effects. In the case of acid-sensitive polymers, it has been possible to determine the extent of acid-catalyzed chemistry which, in turn, provides a means of estimating the acid diffusion range in this polymer film.