Plasma flow simulation in an off-plane double bend magnetic filter
Plasma flow simulation in an off-plane double bend magnetic filter
复制标题
离面双弯磁过滤器中的等离子体流模拟
DOI：
10.1016/s0257-8972(00)00901-4
复制
发表时间：
2000
影响因子：
5.4
通讯作者：
Xuetao Shi
中科院分区：
文献类型：
--
作者：
B. Tay;G. You;S. Lau;Xuetao Shi
阴极电弧等离子体沉积的一个主要缺点是等离子体中存在大颗粒。为了生产出适合硬盘应用的高质量无缺陷薄膜，研制了一种离面双弯滤光片（OPDB）。本文对OPDB滤波阴极真空电弧沉积系统进行了表征。利用法拉第杯、朗缪尔探针和电流探针研究了滤波场和导管偏置等系统参数对等离子体性能的影响。实验结果与基于改进漂移近似模型的仿真结果吻合较好。
A major disadvantage of cathodic arc plasma deposition is the presence of the macroparticles in the plasma. In order to produce high quality defect-free films suitable for hard-disk applications, an off-plane double bend filter (OPDB) has been developed. In this paper the characterization of an OPDB filtered cathodic vacuum arc deposition system is performed. The effects of the system parameters such as filtering field and duct bias on the plasma properties were investigated using Faraday cup, Langmuir and current probes. The experimental results were found to be in good agreement with the simulation results based on an improved drift approximation model.