Patterning colloidal nanotopographies
Patterning colloidal nanotopographies
复制标题
胶体纳米形貌图案化
DOI：
10.1088/0957-4484/13/5/312
复制
发表时间：
2002
期刊：
影响因子：
3.5
通讯作者：
C. Wilkinson
中科院分区：
文献类型：
--
作者：
M. A. Wood;M. Riehle;C. Wilkinson
从生物学的角度来看，创建一个可以同时监测细胞对纳米级形貌和对照（通常是平面）表面的反应的设备是有利的。通过利用自然光刻和常规光刻技术，已经可以创建平面和纳米柱表面并列位于一个器件上的结构。通过图案化光致抗蚀剂，将其暴露于所需的掩模图案，显影并在聚-L-赖氨酸中涂覆，呈现对金胶体颗粒的表面粘合剂。在浸入胶体溶胶（在这种情况下为20 nm直径的金胶体溶胶）中之后，胶体在涂底漆的表面上粘附到聚-L-赖氨酸上。在随后的干法蚀刻步骤中，存在于已经去除抗蚀剂的地方的胶体充当蚀刻掩模，导致柱被蚀刻到基底衬底的表面中，在这种情况下是硅或石英。通过去除抗蚀剂以及胶体，得到平面和纳米柱区域并列的器件。这允许同时监测两个表面上的细胞反应。
Creating a device where cell reactions to nanoscale topographies and a control (usually planar) surface can be monitored simultaneously is advantageous from a biological perspective. Through the utilization of both natural lithography and conventional photolithography techniques, it has been possible to create a structure where planar and nanopillared surfaces lie collaterally on one device. By patterning an optical resist, exposing this to the desired mask pattern, developing and coating in poly-L-lysine, a surface adhesive to gold colloidal particles is presented. Following immersion in a colloidal sol, in this case a 20 nm diameter gold colloidal sol, colloids adhere to the poly-L-lysine across the primed surface. In a subsequent dry etch step, the colloids that are present where the resist has been removed act as an etch mask, resulting in pillars being etched into the surface of a base substrate, in this instance either silicon or quartz. By removing the resist and also the colloids, a device results where planar and nanopillared areas lie collaterally. This allows cell reactions on the two surfaces to be monitored simultaneously.