Preparation of TiO2/boron-doped diamond/Ta multilayer films and use as electrode materials for supercapacitors

Preparation of TiO2/boron-doped diamond/Ta multilayer films and use as electrode materials for supercapacitors
复制标题

TiO2/硼掺杂金刚石/Ta多层薄膜的制备及其作为超级电容器电极材料

DOI:
10.1016/j.apsusc.2015.10.006
复制
发表时间:
2015
影响因子:
6.7
通讯作者:
Baohe Yang
Baohe Yang
中科院分区:
材料科学1区
文献类型:
--
作者:
Chao Shi;Hongji Li;Cuiping Li;Mingji Li;Changqing Qu;Baohe Yang

文献摘要

被引文献

相似文献

报道了纳米二氧化钛/掺硼金刚石(BDD)/Ta多层膜及其作为超级电容器电极的电化学性能。采用电子辅助热丝化学气相沉积技术在Ta衬底上生长了BDD薄膜。采用射频磁控溅射方法在BDD表面沉积钛金属层,并通过电化学刻蚀和热退火法制备了纳米结构的TiO2/BDD/Ta薄膜。用扫描电子显微镜和透射电子显微镜证实了TiO2和Ta层状纳米结构的成功形成。通过循环伏安法、恒电流充放电和阻抗测量,考察了这些电极作为双电层电容器的用途,评价了它们的电化学响应。当以0.1M Na2SO4为电解液时,当B/C比为0.1ww/w时,当扫描频率为5 mV时,电容器的比容量为5.23mF/cm−~2,比容量为5.23mF/cm−~2,且提高了电化学稳定性,500次循环后的保持率为89.3%。这种电化学行为归因于BDD的质量、TiO2层和Ta纳米孔结构的表面粗糙度和电催化活性,以及它们之间的协同作用。这些结果表明,TiO2BDD/Ta薄膜有望成为特殊用途的电容器电极。
We report nanostructured TiO2/boron-doped diamond (BDD)/Ta multilayer films and their electrochemical performances as supercapacitor electrodes. The BDD films were grown on Ta substrates using electron-assisted hot filament chemical vapor deposition. Ti metal layers were deposited on the BDD surfaces by radio frequency magnetron sputtering, and nanostructured TiO2/BDD/Ta thin films were prepared by electrochemical etching and thermal annealing. The successful formation of TiO2and Ta layered nanostructures was demonstrated using scanning electron and transmission electron microscopies. The electrochemical responses of these electrodes were evaluated by examining their use as electrical double-layer capacitors, using cyclic voltammetry, and galvanostatic charge/discharge and impedance measurements. When the TiO2/BDD/Ta film was used as the working electrode with 0.1 M Na2SO4as the electrolyte, the capacitor had a specific capacitance of 5.23 mF cm−2at a scan rate of 5 mV s−1for a B/C ratio of 0.1% w/w. Furthermore, the TiO2/BDD/Ta film had improved electrochemical stability, with a retention of 89.3% after 500 cycles. This electrochemical behavior is attributed to the quality of the BDD, the surface roughness and electrocatalytic activities of the TiO2layer and Ta nanoporous structures, and the synergies between them. These results show that TiO2/BDD/Ta films are promising as capacitor electrodes for special applications.