Preparation of TiO2/boron-doped diamond/Ta multilayer films and use as electrode materials for supercapacitors
Preparation of TiO2/boron-doped diamond/Ta multilayer films and use as electrode materials for supercapacitors
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TiO2/硼掺杂金刚石/Ta多层薄膜的制备及其作为超级电容器电极材料
DOI:
10.1016/j.apsusc.2015.10.006
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发表时间:
2015
影响因子:
6.7
通讯作者:
Baohe Yang
中科院分区:
文献类型:
--
作者:
Chao Shi;Hongji Li;Cuiping Li;Mingji Li;Changqing Qu;Baohe Yang
We report nanostructured TiO2/boron-doped diamond (BDD)/Ta multilayer films and their electrochemical performances as supercapacitor electrodes. The BDD films were grown on Ta substrates using electron-assisted hot filament chemical vapor deposition. Ti metal layers were deposited on the BDD surfaces by radio frequency magnetron sputtering, and nanostructured TiO2/BDD/Ta thin films were prepared by electrochemical etching and thermal annealing. The successful formation of TiO2and Ta layered nanostructures was demonstrated using scanning electron and transmission electron microscopies. The electrochemical responses of these electrodes were evaluated by examining their use as electrical double-layer capacitors, using cyclic voltammetry, and galvanostatic charge/discharge and impedance measurements. When the TiO2/BDD/Ta film was used as the working electrode with 0.1 M Na2SO4as the electrolyte, the capacitor had a specific capacitance of 5.23 mF cm−2at a scan rate of 5 mV s−1for a B/C ratio of 0.1% w/w. Furthermore, the TiO2/BDD/Ta film had improved electrochemical stability, with a retention of 89.3% after 500 cycles. This electrochemical behavior is attributed to the quality of the BDD, the surface roughness and electrocatalytic activities of the TiO2layer and Ta nanoporous structures, and the synergies between them. These results show that TiO2/BDD/Ta films are promising as capacitor electrodes for special applications.