Mechanisms of nanooxidation of Si(100) from atomic force microscopy
Mechanisms of nanooxidation of Si(100) from atomic force microscopy
复制标题
DOI：
10.1016/j.mejo.2004.06.022
复制
发表时间：
2004-09-01
影响因子：
2.2
通讯作者：
Fang, TH
中科院分区：
文献类型：
--
作者：
Fang, TH
利用原子力显微镜研究了纳米光刻过程的加工特性。通过纳米氧化实验，研究了不同实验参数对纳米线、纳米点的高度、宽度、生长速率以及加工效率的影响。实验参数包括：外加电压、湿度、扫描氧化时间、晶体取向和探针尖端的形状。结果表明，随着氧化时间和外加电压的增加，纳米线的高度和宽度也随之增加。“此外，当湿度较高时，会产生高度增加的纳米线。最后，随着探头尖端开始磨损和尖端半径的增加，会产生高度和宽度都更高的纳米线。(C)2004爱思唯尔有限公司。保留所有权利。
The machining characteristics of the nanolithographic process were studied using atomic force microscopy. Nano-oxidation experiments were conducted to investigate the influence that the different experimental parameters had on height, width and the growth rate of the nanowires and nanodots as well as upon the machining efficiency. The experimental parameters included; the applied voltage, humidity, scanning oxidization time, crystalline orientation and the shape of the probe tip. The results indicated that as the oxidization time and the applied voltage were increased, the nanowire's height and width also increased. 'Also, a nanowire with increased height was produced when the humidity was higher. Finally as the probe tip began to wear and the tip's radius increased, a nanowire with a higher height and width was produced. (C) 2004 Elsevier Ltd. All rights reserved.