Oxidative Damage Induced by Heat Stress Could be Relieved by Nitric Oxide in Trichoderma harzianum LTR-2
Oxidative Damage Induced by Heat Stress Could be Relieved by Nitric Oxide in Trichoderma harzianum LTR-2
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DOI：
10.1007/s00284-014-0764-8
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发表时间：
2015-01
影响因子：
2.6
通讯作者：
Yang Yu;Zijun Yang;Kai Guo;Zhe Li;Hongzi Zhou;Yanli Wei;Jishun Li;Xinjian Zhang;P. Harvey;Hetong Yang
中科院分区：
文献类型：
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作者：
Yang Yu;Zijun Yang;Kai Guo;Zhe Li;Hongzi Zhou;Yanli Wei;Jishun Li;Xinjian Zhang;P. Harvey;Hetong Yang
哈茨戊木霉是一种重要的商业生防真菌。温度是真菌菌丝生长的重要参数，具有菌株特异性，但对哈茨木霉菌丝生长的机制研究较少。在我们的研究中，6小时的热处理增加了硫代巴比妥酸反应物质（TBARS）和一氧化氮（NO）的浓度在菌丝体的212和230%的水平，分别控制。外源NO供体硝普钠（150 μM）使TBARS浓度降低到热应激（HS）下的53%。同时，250 μM的NO特异性清除剂2-（4-羧基苯基）-4，4，5，5-四甲基咪唑啉-1-1-氧基-3-氧化物（2-（4-carboxyphenyl）-4，4，5，5-tetramethylimidazoline-1-1-oxyl-3-oxide）抑制了外源NO缓解的TBARS在HS条件下的积累。NO合成酶（NOS）抑制剂L-NG-nitroarginine methyl ester可降低HS下NO浓度的41%，而硝酸还原酶（NR）抑制剂钨酸盐则不能。研究表明，NO对T. harzipentudine通过增强NOS和NR活性减轻氧化损伤。
Trichoderma harzianumis an important commercial biocontrol fungal agent. The temperature has been shown to be an important parameter and strain-specific to the mycelia growth of fungi, but less report makes the known of the mechanisms inT. harzianum. In our study, a 6-h treatment of heat increased the thiobarbituric acid reactive substances (TBARS) and nitric oxide (NO) concentration in mycelia to 212 and 230 % the level of the control, respectively. The exogenous NO donor sodium nitroprusside (150 μM) reduced the TBARS concentration to 53 % of that under heat stress (HS). At the same time, the NO-specific scavenger at 250 μM, 2-(4-carboxyphenyl)-4,4,5,5-tetramethylimidazoline-1-1-oxyl-3-oxide, prevented the exogenous NO-relieved TBARS accumulation under HS. The increased NO concentration under HS was reduced 41 % by the NO synthase (NOS) inhibitor L-NG-nitroarginine methyl ester, but not the nitrate reductase (NR) inhibitor tungstate. Our study exhibited that NO can protect the mycelia ofT. harzianumfrom HS and reduce the oxidative damage by enhancing the activity of NOS and NR.