The best of both worlds: automated CMP polishing of channel-cut monochromators
The best of both worlds: automated CMP polishing of channel-cut monochromators
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两全其美：通道切割单色仪的自动 CMP 抛光
DOI：
10.1117/12.2196034
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发表时间：
2015
期刊：
影响因子：
--
通讯作者：
S. Stoupin
中科院分区：
文献类型：
--
作者：
E. Kasman;Mark Erdmann;S. Stoupin
使用通道切割单色器是确保两个反射表面保持晶面之间对齐而不需要复杂对齐机制的最直接方法。影响单色器性能的三个基本特征是：污染光谱纯度的次表面损伤;由于散射而降低效率的表面粗糙度;以及赋予光束中的强度结构和相干性失真的表面形状误差。标准的化学机械抛光工艺和设备用于衍射表面容易接近的情况，例如单反射单色仪。由于通道切割单色器内部的表面难以进行抛光，因此这些光学器件通常在其最终加工中进行湿法蚀刻。这导致最小的亚表面损伤，但非常差的粗糙度和形状误差。提出了一种新的CMP通道抛光装置的设计，它允许通道切割晶体的内部衍射表面质量接近传统的单反弹单色器。
The use of a channel-cut monochromator is the most straightforward method to ensure that the two reflection surfaces maintain alignment between crystallographic planes without the need for complicated alignment mechanisms. Three basic characteristics that affect monochromator performance are: subsurface damage which contaminates spectral purity; surface roughness which reduces efficiency due to scattering; and surface figure error which imparts intensity structure and coherence distortion in the beam. Standard chemical-mechanical polishing processes and equipment are used when the diffracting surface is easily accessible, such as for single-bounce monochromators. Due to the inaccessibly of the surfaces inside a channel-cut monochromator for polishing, these optics are generally wet-etched for their final processing. This results in minimal subsurface damage, but very poor roughness and figure error. A new CMP channel polishing instrument design is presented which allows the internal diffracting surface quality of channel-cut crystals to approach that of conventional single-bounce monochromators.