Monitoring the Acidolytic Behavior of a Latent Pigment Enhanced by an Acid Amplifier in Polymer Films
Monitoring the Acidolytic Behavior of a Latent Pigment Enhanced by an Acid Amplifier in Polymer Films
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监测聚合物薄膜中酸放大器增强的潜在颜料的酸解行为
DOI:
10.2494/photopolymer.13.221
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发表时间:
2000
期刊:
影响因子:
--
通讯作者:
K. Ichimura
中科院分区:
文献类型:
--
作者:
M. Tahara;K. Arimitsu;Sang Wok Park;Sungeun Lee;K. Ichimura
The concept of latent pigments has been proposed to disperse the insoluble parent pigment homogeneously in paints, plastics, printing inks, and so on. [ 1 ] Latent pigments are soluble precursors with protective groups, which can be removed by acid-catalyzed reactions in polymer matrices, leading to the regeneration of insoluble pigments (Scheme 1).[2] However, detailed information concerning the acidolytic behavior of latent pigments sensitized with a photoacid generator in polymer films has been limited. On the other hand, we proposed the concept of acid proliferations comprised of acid-sensitive compounds referred to as acid amplifiers.[3-10] It is anticipated that the addition of the acid amplifiers to latent pigments sensitized with a photoacid generator leads to the enhancement of their acid-catalyzed transformation to the corresponding pigments (Scheme 2). Our primary concern here is to monitor the acidolytic behavior of latent pigments in polymer films and to enhance their photoinduced transformation of latent pigments into parent pigments in the presence of an acid amplifier. BOC-Indigo (1) as a latent pigment was synthesized according to the literature [1 1 ]. A polymer solution was prepared by dissolving poly[(a-methyl)styrene] (PMSt) (0.1 g l 1.0 mL), 1 (25 wt% relative to the polymer), Biphenyl-[4-(phenylthio)phenyl]sulfonium hexafluoroantimonate (DPS, 6 wt% relative to the polymer) as a photoacid generator and cisl -phenyl-2-(p-toluenesulfonyloxy)-1-cyclohe xanol 3 (6 or 11 wt% relative to the polymer) as an acid amplifier in cyclopentanone. The solution was spin-coated on CaF2 substrates and baked at 110 °C for 60 sec on a hot stage. The films were exposed to 313 nm light obtained from a Hg-Xe lamp and covered with CaF2 substrates to suppress the evaporation of 1 and acidic species. The films covered with CaF2 substrates were heated at 110 °C and were subjected to UV/Vis and IR absorption measurement at intervals to monitor the acidolytic behavior of 1. Scheme 1. Acid-catalyzed deprotection of 1. Scheme 2. Photomduced