Surface analysis of ultraprecise polished chemical vapor deposited diamond films using spectroscopic and microscopic techniques
Surface analysis of ultraprecise polished chemical vapor deposited diamond films using spectroscopic and microscopic techniques
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使用光谱和显微技术对超精密抛光化学气相沉积金刚石薄膜进行表面分析
DOI：
10.1063/1.1342199
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发表时间：
2001
影响因子：
3.2
通讯作者：
T. Fries
中科院分区：
文献类型：
--
作者：
J. Weima;R. Job;W. Fahrner;G. Kosaca;N. Muller;T. Fries
采用热化学抛光法对不同晶向和尺寸的化学气相沉积（CVD）金刚石薄膜进行抛光。在这项工作中使用的构成薄膜的颗粒的尺寸范围在10和100 μm之间。通过扫描电子显微镜（SEM）获得抛光前后薄膜表面形貌的图像。使用触针轮廓仪来确定所生长的金刚石膜的表面粗糙度（算术平均偏差）。生长侧的平均表面粗糙度约为30 μm，衬底侧的平均表面粗糙度约为7 μm。在750 ° C和1000 °C之间的温度下抛光几个小时使膜的生长侧和衬底侧的表面粗糙度分别减薄至约1.3和1.5 nm，如通过原子力显微镜测量的。 拉曼光谱揭示了低能量的非金刚石碳线的频率范围在200和700 cm-1之间的光学梯度金刚石薄膜的抛光表面上，除了...
Chemical vapor deposited (CVD) diamond films of varying crystallographic orientations and sizes were thermochemically polished on steel plates. The sizes of the grains constituting the films used in this work ranged between 10 and 100 μm. Images of the surface morphologies of the films were obtained by the scanning electron microscope (SEM) before and after polishing. A stylus profilometer was used to determine the surface roughness (arithmetic mean deviation) of the as-grown diamond films. The average surface roughness was found to be about 30 μm on the growth side and about 7 μm on the substrate side. Polishing for several hours at temperatures between 750 and 1000 °C thinned the surface roughness down to about 1.3 and 1.5 nm on the growth and substrate sides, respectively, of the film as measured by the atomic force microscope. Raman spectroscopy revealed low energy nondiamond carbon lines in the frequency range between 200 and 700 cm−1 on polished surfaces of optical graded diamond films in addition t...