Carbon shunting arc and its induced plasma
Carbon shunting arc and its induced plasma
复制标题
碳分流电弧及其感应等离子体
DOI：
10.1063/1.1150422
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发表时间：
2000
影响因子：
1.6
通讯作者：
Yuji Tani
中科院分区：
文献类型：
--
作者：
K. Yukimura;K. Yoshioka;Yuji Tani
脉冲碳弧在低压气体或真空中产生，无需任何外部触发源。电弧围绕碳棒引发，碳棒使用与电弧相同的电源加热。这被称为分流电弧，其特征在于电弧是自启动的，并且容易获得具有正弦波形的超过1000 A的电流。光谱测量表明，分流电弧在腔室中诱导了新的氮等离子体。因此，在一个分流电弧产生过程中存在两种不同的等离子体。作为等离子体基离子注入的初步研究，脉冲碳离子从电弧等离子体中提取，并通过直接向靶施加脉冲高压注入到放置在腔室中的靶中。
A pulsed carbon arc is produced in a low-pressure gas or vacuum without any external trigger source. The arc is initiated around a carbon rod that is heated using a same power source with the arc. This is called a shunting arc and it is characteristic that the arc is self-initiated and its current of over 1000 A with a sinusoidal waveform is easily attained. Spectroscopic measurement shows that the shunting arc induces a new nitrogen plasma in the chamber. Thus, two different plasmas exist in one shunting arc production process. As a preliminary research of plasma-based ion implantation, pulsed carbon ions are extracted from the arc plasma and implanted into a target placed in the chamber by directly applying a pulsed high voltage to the target.