Potassium Hydroxide Activated and Nitrogen Doped Graphene with Enhanced Supercapacitive Behavior
Potassium Hydroxide Activated and Nitrogen Doped Graphene with Enhanced Supercapacitive Behavior
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DOI：
10.1166/sam.2018.3279
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发表时间：
2018-07-01
影响因子：
0.9
通讯作者：
Guo, Zhanhu
中科院分区：
文献类型：
--
作者：
Deng, Weiyuan;Kang, Tianhe;Guo, Zhanhu
为了合成高性能的超级电容器电极材料以满足储能的迫切需求，采用水热法制备了氮掺杂的活性石墨烯（N-AG），使用水热法进行KOH活化和随后的氮掺杂。在KOH活化后和随后的N掺杂过程中，在拉曼光谱中观察到连续增加的I-D / I-G比，这表明由于KOH的蚀刻效应和石墨烯片上引入的氮缺陷而导致的缺陷增加。在KOH蚀刻之后，在TEM图像中清楚地看到表面上具有受损片的堆叠石墨烯。XPS谱图和EDS图表明N的成功掺杂，证实了有效的水热N掺杂方法。与氮掺杂的石墨烯（N-G，50.88F/g）和活化的石墨烯（AG，58.38F/g）相比，N-AG表现出大大增强的电容（186.63F/g）和循环稳定性，这是由于KOH活化和N掺杂的组合积极效应。
For the goal of synthesizing high performance supercapacitor electrode materials to meet the pressing requirements of energy storage, a facile hydrothermal method was employed to prepare nitrogen doped activated graphene (N-AG), two steps, i.e., KOH activating and following nitrogen doping were performed using a hydrothermal method. Continuously increased I-D / I-G ratios were observed in the Raman spectra after KOH activation and following N-doping processes, indicating increased defects due to the etching effect of KOH and introduced nitrogen defects on graphene sheet. Stacked graphene with damaged sheets on the surface was clearly seen in TEM image after the KOH etching. The successful dopant of N was demonstrated by XPS spectra and EDS mapping, confirming the effective hydrothermal N doping method. The N-AG exhibited largely enhanced capacitance (186.63 F/g) and cycling stability compared with that of nitrogen doped graphene (N-G, 50.88 F/g) and activated graphene (AG, 58.38 F/g) due to the combined positive effects of KOH activation and N-doping.