Film Thickness in Gas-Liquid Two-Phase Flow : 4fh Report, Film Thinning Mechanism During the Drainage
Film Thickness in Gas-Liquid Two-Phase Flow : 4fh Report, Film Thinning Mechanism During the Drainage
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气液两相流中的膜厚：4fh报告，排水过程中的膜减薄机制
DOI：
10.1299/jsme1958.23.553
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发表时间：
1980
期刊：
影响因子：
--
通讯作者：
K. Sekoguchi
中科院分区：
文献类型：
--
作者：
T. Fukano;Yasushi Kawakami;H. Shimizu;K. Sekoguchi
在具有流障的气液两相向上流动系统中，已有文献报道，由于阻止气段塞周围水膜的反向流动，导致障碍物下方的水膜厚度由于排水而大大减小。本文提出了一种实验与分析相结合的方法来了解排水过程中膜变薄的机理。给出了最小膜厚形成的物理背景，并认为疏水引起的膜变薄效应是在绝热条件下产生干斑的主要原因。
In a gas-liquid two-phase upward flow system with a flow obstacle, it has been reported in previous papers, the water film thickness below the obstacle is extremely reduced due to a drainage, which is caused by the prevention of a reverse flow of water film surrounding a gas slug. This paper presents an experimental and analytical approach to understand the film thinning mechanism during the drainage. A physical background for the formation of the minimum film thickness is also provided, and the film thinning effect due to drainage is suggested to be principal cause producing dry patch under diabatic condition.