An analytical observation of the tribochemical reaction of silicon nitride sliding with low friction in aqueous solutions
An analytical observation of the tribochemical reaction of silicon nitride sliding with low friction in aqueous solutions
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DOI：
10.1016/s0043-1648(96)07287-0
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发表时间：
1997-04
期刊：
影响因子：
5
通讯作者：
Toshiyuki Saito;Y. Imada;F. Honda
中科院分区：
文献类型：
--
作者：
Toshiyuki Saito;Y. Imada;F. Honda
研究了氮化硅在蒸馏水、1% h2o2和3% NaCl水溶液中与同一材料的摩擦磨损。滑动过程中，氮化硅在水中的摩擦系数μ由0.8减小到0.01。在1% h2o2溶液中，摩擦系数比在纯水中下降得更早。但在3% NaCl溶液中，滑动超过1000 m时，摩擦系数保持较高值（μ = 0.8）。对氮化硅磨损屑在3% NaCl溶液中的分析表明，磨损屑的组成符合Na:Si:O = 1:2-3:4-5，这可能抑制了滑动固体表面的润滑表面摩擦力。分析结果支持了低摩擦系数氮化硅表面滑动是由Na+离子取代的反应位组成的理论。结果表明，支撑氮化硅表面高接触压力的润滑膜中含有硅的氢氧化物。提出了滑动面的结构模型。
Friction and wear of silicon nitride sliding against the same material is investigated in aqueous solutions: distilled water, 1% H2O2and 3% NaCl. The friction coefficient (μ) of silicon nitride in water decreases from 0.8 to 0.01 during sliding. In a 1% H2O2solution, the friction coefficient decreases at an earlier stage of sliding than in pure water. But in 3% NaCl solution, the friction coefficient keeps a high value (μ = 0.8) during sliding over 1000 m. Analysis of the wear debris of silicon nitride in 3% NaCl solution shows that the composition of the debris corresponds to Na:Si:O = 1:2–3:4–5, which supposedly suppresses the lubricating surface friction force on the sliding solid surfaces. The analytical results support the theory that the silicon nitride surface sliding with a low friction coefficient is composed of a reactive site substitutable by a Na+ion. The results indicate that the lubricant film which supports the high contact pressure between silicon nitride surfaces includes the hydroxide of silicon. A structural model of the sliding surface is proposed.