The pristine atomic structure of MoS2 monolayer protected from electron radiation damage by graphene
The pristine atomic structure of MoS2 monolayer protected from electron radiation damage by graphene
复制标题
DOI：
10.1063/1.4830036
复制
发表时间：
2013-11-11
影响因子：
4
通讯作者：
Kaiser, Ute
中科院分区：
文献类型：
--
作者：
Algara-Siller, Gerardo;Kurasch, Simon;Kaiser, Ute
原则上，可以使用像差校正透射电子显微镜在单个原子水平上对材料进行成像。然而，只有非常高的电子剂量才能达到这样的分辨率。因此，在表征敏感材料时，辐射损伤通常是限制因素。在这里，我们展示了一种简单有效的方法，通过使用石墨烯作为保护涂层来提高材料的电子辐射耐受性。这使得单层 MoS2 的辐射耐受性提高了三个数量级。此外，我们构建了不同异质结构配置的样本，以区分不同辐射损伤机制的贡献。 (C) 2013 AIP 出版有限责任公司。
Materials can, in principle, be imaged at the level of individual atoms with aberration-corrected transmission electron microscopy. However, such resolution can be attained only with very high electron doses. Consequently, radiation damage is often the limiting factor when characterizing sensitive materials. Here, we demonstrate a simple and an effective method to increase the electron radiation tolerance of materials by using graphene as protective coating. This leads to an improvement of three orders of magnitude in the radiation tolerance of monolayer MoS2. Further on, we construct samples in different heterostructure configurations to separate the contributions of different radiation damage mechanisms. (C) 2013 AIP Publishing LLC.